| Brand Name: | UW |
| MOQ: | 1set |
| Price: | Negotiation |
| Payment Terms: | T/T |
Equipment Introduction
The equipment’s laser system uses instantaneous high-energy-density laser to achieve ablation and evaporation, selectively removing masks or dielectric films, and is used to remove the BSG layer from designated areas of battery wafers. It supports an automatic loading and unloading system, compatible with the customer’s on-site AGV system. Carrier cassettes are automatically loaded from AGV to the equipment’s loading conveyor belt; silicon wafers are picked up automatically from cassettes, conveyed directly to the laser marking station, laser-marked after CCD visual positioning, and then sent to the unloading cassette via the unloading conveyor belt. Full cassettes are then transported to the on-site AGV by the conveyor belt.
Highlights
Technical Parameters
| Equipment Performance | Specification Parameters |
| Operating Mode | Offline Mode |
| Applicable Battery Size | Compatible with sizes up to 230*230mm (semi-cell customization available) |
| Applicable Battery Thickness | 150±50μm |
| Loading/Unloading Method | AGV Robot Compatible |
| Graphic Accuracy | ±15μm |
| Positioning Accuracy | Edge-Grabbing Accuracy (Repeatability): ≤ ±15μm @ 182mm; Point-Grabbing Accuracy: ≤ ±10μm @ 182mm |
| Machine Capacity Example |
Theoretical Capacity: (Based on laser film removal graphic processing time) Single Laser Pass: >7200 Pcs/h for 182*91 size; >6000 Pcs/h for 182*105 size Dual Laser Passes: >7500 Pcs/h for 182*91 size; >7000 Pcs/h for 182*105 size |
| Fragment Rate | ≤ 0.02% |
| Configuration | Dual-Track 4-Head or Dual-Track 2-Head |
| Spot Size | Square flat-top homogenized spot, size customizable from 100 to 500 μm. |